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Device-Level Thermal Management and Reliability of Gallium Nitride and Aluminum Gallium Nitride High Electron Mobility Transistors
Device-Level Thermal Management and Reliability of Gallium Nitride and Aluminum Gallium Nitride High Electron Mobility Transistors
상세정보
- 자료유형
- 학위논문 서양
- 최종처리일시
- 20260209102914
- ISBN
- 9798263397111
- DDC
- 660
- 서명/저자
- Device-Level Thermal Management and Reliability of Gallium Nitride and Aluminum Gallium Nitride High Electron Mobility Transistors
- 발행사항
- [Sl] : Georgia Institute of Technology, 2023
- 발행사항
- Ann Arbor : ProQuest Dissertations & Theses, 2023
- 형태사항
- 164 p
- 주기사항
- Source: Dissertations Abstracts International, Volume: 87-05, Section: A.
- 주기사항
- Advisor: Graham, Samuel.
- 학위논문주기
- Thesis (Ph.D.)--Georgia Institute of Technology, 2023.
- 초록/해제
- 요약The fields of power and radio frequency (RF) electronics have experienced tremendous growth over recent years as gallium nitride (GaN) device technology is maturing. GaN high electron mobility transistors (HEMTs) are particularly well-suited for high-power and high-frequency applications due to their excellent sheet charge density and channel mobility, and the large bandgap energy of GaN. However, GaN HEMTs suffer from acute self-heating that limits their performance in high-power and high-frequency applications. The most recent advancements in GaN HEMT device-level thermal management consist of integrating high-thermal conductivity chemical vapor deposited (CVD) diamond substrates to GaN HEMT device layers (GaN-on-diamond technology). While the thermal merits for CVD diamond substrate integration are clear, the structural integrity and reliability of GaN-on-diamond HEMTs requires further investigation. To study the structural impact that CVD diamond integration has on GaN HEMTs, GaN-on-diamond materials fabricated by various techniques have been examined via optical stress metrology techniques.Ultra-wide bandgap (UWBG) aluminum gallium nitride (AlGaN) HEMTs have the potential to exceed the performance limitations of GaN HEMTs for the next generation of power and RF electronic device technologies. The acute self-heating challenges for highpower GaN HEMTs are exacerbated for AlGaN HEMTs because the thermal conductivity of AlGaN is an order of magnitude lower than that of GaN. The low thermal conductivity of AlGaN increases the device thermal resistance of AlGaN HEMTs and changes the transient thermal dynamics of AlGaN HEMTs under pulsed-mode operation. Therefore, AlGaN HEMT devices require novel device-level thermal management solutions to realize their theoretical performance potential. To address the thermal management challenges, novel device-level thermal management approaches have been identified via thermal finite element analysis (FEA) and in situ junction temperature experiments.
- 일반주제명
- Silicon nitride
- 일반주제명
- Satellite communications
- 일반주제명
- Spectrum analysis
- 일반주제명
- Failure analysis
- 일반주제명
- Semiconductors
- 일반주제명
- Residual stress
- 일반주제명
- Conductivity
- 일반주제명
- Electric fields
- 일반주제명
- Electric vehicles
- 일반주제명
- Light emitting diodes
- 일반주제명
- Aluminum
- 일반주제명
- Molecular beam epitaxy
- 일반주제명
- Electronics
- 일반주제명
- Transistors
- 일반주제명
- Stress analysis
- 일반주제명
- Heat conductivity
- 일반주제명
- Thin films
- 일반주제명
- Stress measurement
- 일반주제명
- Aerospace engineering
- 일반주제명
- Analytical chemistry
- 일반주제명
- Condensed matter physics
- 일반주제명
- Electrical engineering
- 일반주제명
- Materials science
- 일반주제명
- Optics
- 일반주제명
- Thermodynamics
- 일반주제명
- Transportation
- 일반주제명
- Electromagnetics
- 기본자료저록
- Dissertations Abstracts International. 87-05A.
- 전자적 위치 및 접속
- 로그인 후 원문을 볼 수 있습니다.
MARC
008260203s2023 us c eng d■001000017366016
■00520260209102914
■006m o d
■007cr#unu||||||||
■020 ▼a9798263397111
■035 ▼a(MiAaPQ)AAI32316216
■035 ▼a(MiAaPQ)GeorgiaTech72785
■040 ▼aMiAaPQ▼cMiAaPQ
■0820 ▼a660
■1001 ▼aHines, Nicholas J.
■24510▼aDevice-Level Thermal Management and Reliability of Gallium Nitride and Aluminum Gallium Nitride High Electron Mobility Transistors
■260 ▼a[Sl]▼bGeorgia Institute of Technology▼c2023
■260 1▼aAnn Arbor▼bProQuest Dissertations & Theses▼c2023
■300 ▼a164 p
■500 ▼aSource: Dissertations Abstracts International, Volume: 87-05, Section: A.
■500 ▼aAdvisor: Graham, Samuel.
■5021 ▼aThesis (Ph.D.)--Georgia Institute of Technology, 2023.
■520 ▼aThe fields of power and radio frequency (RF) electronics have experienced tremendous growth over recent years as gallium nitride (GaN) device technology is maturing. GaN high electron mobility transistors (HEMTs) are particularly well-suited for high-power and high-frequency applications due to their excellent sheet charge density and channel mobility, and the large bandgap energy of GaN. However, GaN HEMTs suffer from acute self-heating that limits their performance in high-power and high-frequency applications. The most recent advancements in GaN HEMT device-level thermal management consist of integrating high-thermal conductivity chemical vapor deposited (CVD) diamond substrates to GaN HEMT device layers (GaN-on-diamond technology). While the thermal merits for CVD diamond substrate integration are clear, the structural integrity and reliability of GaN-on-diamond HEMTs requires further investigation. To study the structural impact that CVD diamond integration has on GaN HEMTs, GaN-on-diamond materials fabricated by various techniques have been examined via optical stress metrology techniques.Ultra-wide bandgap (UWBG) aluminum gallium nitride (AlGaN) HEMTs have the potential to exceed the performance limitations of GaN HEMTs for the next generation of power and RF electronic device technologies. The acute self-heating challenges for highpower GaN HEMTs are exacerbated for AlGaN HEMTs because the thermal conductivity of AlGaN is an order of magnitude lower than that of GaN. The low thermal conductivity of AlGaN increases the device thermal resistance of AlGaN HEMTs and changes the transient thermal dynamics of AlGaN HEMTs under pulsed-mode operation. Therefore, AlGaN HEMT devices require novel device-level thermal management solutions to realize their theoretical performance potential. To address the thermal management challenges, novel device-level thermal management approaches have been identified via thermal finite element analysis (FEA) and in situ junction temperature experiments.
■590 ▼aSchool code: 0078.
■650 4▼aSilicon nitride
■650 4▼aTransmission electron microscopy
■650 4▼aSatellite communications
■650 4▼aSpectrum analysis
■650 4▼aFailure analysis
■650 4▼aSemiconductors
■650 4▼aResidual stress
■650 4▼aConductivity
■650 4▼aElectric fields
■650 4▼aElectric vehicles
■650 4▼aChemical vapor deposition
■650 4▼aLight emitting diodes
■650 4▼aAluminum
■650 4▼aMolecular beam epitaxy
■650 4▼aElectronics
■650 4▼aTransistors
■650 4▼aStress analysis
■650 4▼aHeat conductivity
■650 4▼aThin films
■650 4▼aStress measurement
■650 4▼aScanning electron microscopy
■650 4▼aAerospace engineering
■650 4▼aAnalytical chemistry
■650 4▼aCondensed matter physics
■650 4▼aElectrical engineering
■650 4▼aMaterials science
■650 4▼aOptics
■650 4▼aThermodynamics
■650 4▼aTransportation
■650 4▼aElectromagnetics
■690 ▼a0538
■690 ▼a0486
■690 ▼a0611
■690 ▼a0544
■690 ▼a0794
■690 ▼a0752
■690 ▼a0348
■690 ▼a0709
■690 ▼a0607
■71020▼aGeorgia Institute of Technology.
■7730 ▼tDissertations Abstracts International▼g87-05A.
■790 ▼a0078
■791 ▼aPh.D.
■792 ▼a2023
■793 ▼aEnglish
■85640▼uhttp://www.riss.kr/pdu/ddodLink.do?id=T17366016▼nKERIS▼z이 자료의 원문은 한국교육학술정보원에서 제공합니다.


