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Device-Level Thermal Management and Reliability of Gallium Nitride and Aluminum Gallium Nitride High Electron Mobility Transistors
Device-Level Thermal Management and Reliability of Gallium Nitride and Aluminum Gallium Ni...
Device-Level Thermal Management and Reliability of Gallium Nitride and Aluminum Gallium Nitride High Electron Mobility Transistors

상세정보

자료유형  
 학위논문 서양
최종처리일시  
20260209102914
ISBN  
9798263397111
DDC  
660
저자명  
Hines, Nicholas J.
서명/저자  
Device-Level Thermal Management and Reliability of Gallium Nitride and Aluminum Gallium Nitride High Electron Mobility Transistors
발행사항  
[Sl] : Georgia Institute of Technology, 2023
발행사항  
Ann Arbor : ProQuest Dissertations & Theses, 2023
형태사항  
164 p
주기사항  
Source: Dissertations Abstracts International, Volume: 87-05, Section: A.
주기사항  
Advisor: Graham, Samuel.
학위논문주기  
Thesis (Ph.D.)--Georgia Institute of Technology, 2023.
초록/해제  
요약The fields of power and radio frequency (RF) electronics have experienced tremendous growth over recent years as gallium nitride (GaN) device technology is maturing. GaN high electron mobility transistors (HEMTs) are particularly well-suited for high-power and high-frequency applications due to their excellent sheet charge density and channel mobility, and the large bandgap energy of GaN. However, GaN HEMTs suffer from acute self-heating that limits their performance in high-power and high-frequency applications. The most recent advancements in GaN HEMT device-level thermal management consist of integrating high-thermal conductivity chemical vapor deposited (CVD) diamond substrates to GaN HEMT device layers (GaN-on-diamond technology). While the thermal merits for CVD diamond substrate integration are clear, the structural integrity and reliability of GaN-on-diamond HEMTs requires further investigation. To study the structural impact that CVD diamond integration has on GaN HEMTs, GaN-on-diamond materials fabricated by various techniques have been examined via optical stress metrology techniques.Ultra-wide bandgap (UWBG) aluminum gallium nitride (AlGaN) HEMTs have the potential to exceed the performance limitations of GaN HEMTs for the next generation of power and RF electronic device technologies. The acute self-heating challenges for highpower GaN HEMTs are exacerbated for AlGaN HEMTs because the thermal conductivity of AlGaN is an order of magnitude lower than that of GaN. The low thermal conductivity of AlGaN increases the device thermal resistance of AlGaN HEMTs and changes the transient thermal dynamics of AlGaN HEMTs under pulsed-mode operation. Therefore, AlGaN HEMT devices require novel device-level thermal management solutions to realize their theoretical performance potential. To address the thermal management challenges, novel device-level thermal management approaches have been identified via thermal finite element analysis (FEA) and in situ junction temperature experiments.
일반주제명  
Silicon nitride
일반주제명  
Transmission electron microscopy
일반주제명  
Satellite communications
일반주제명  
Spectrum analysis
일반주제명  
Failure analysis
일반주제명  
Semiconductors
일반주제명  
Residual stress
일반주제명  
Conductivity
일반주제명  
Electric fields
일반주제명  
Electric vehicles
일반주제명  
Chemical vapor deposition
일반주제명  
Light emitting diodes
일반주제명  
Aluminum
일반주제명  
Molecular beam epitaxy
일반주제명  
Electronics
일반주제명  
Transistors
일반주제명  
Stress analysis
일반주제명  
Heat conductivity
일반주제명  
Thin films
일반주제명  
Stress measurement
일반주제명  
Scanning electron microscopy
일반주제명  
Aerospace engineering
일반주제명  
Analytical chemistry
일반주제명  
Condensed matter physics
일반주제명  
Electrical engineering
일반주제명  
Materials science
일반주제명  
Optics
일반주제명  
Thermodynamics
일반주제명  
Transportation
일반주제명  
Electromagnetics
기타저자  
Georgia Institute of Technology.
기본자료저록  
Dissertations Abstracts International. 87-05A.
전자적 위치 및 접속  
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MARC

 008260203s2023        us                              c    eng  d
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■020    ▼a9798263397111
■035    ▼a(MiAaPQ)AAI32316216
■035    ▼a(MiAaPQ)GeorgiaTech72785
■040    ▼aMiAaPQ▼cMiAaPQ
■0820  ▼a660
■1001  ▼aHines,  Nicholas  J.
■24510▼aDevice-Level  Thermal  Management  and  Reliability  of  Gallium  Nitride  and  Aluminum  Gallium  Nitride  High  Electron  Mobility  Transistors
■260    ▼a[Sl]▼bGeorgia  Institute  of  Technology▼c2023
■260  1▼aAnn  Arbor▼bProQuest  Dissertations  &  Theses▼c2023
■300    ▼a164  p
■500    ▼aSource:  Dissertations  Abstracts  International,  Volume:  87-05,  Section:  A.
■500    ▼aAdvisor:  Graham,  Samuel.
■5021  ▼aThesis  (Ph.D.)--Georgia  Institute  of  Technology,  2023.
■520    ▼aThe  fields  of  power  and  radio  frequency  (RF)  electronics  have  experienced  tremendous  growth  over  recent  years  as  gallium  nitride  (GaN)  device  technology  is  maturing.  GaN  high  electron  mobility  transistors  (HEMTs)  are  particularly  well-suited  for  high-power  and  high-frequency  applications  due  to  their  excellent  sheet  charge  density  and  channel  mobility,  and  the  large  bandgap  energy  of  GaN.  However,  GaN  HEMTs  suffer  from  acute  self-heating  that  limits  their  performance  in  high-power  and  high-frequency  applications.  The  most  recent  advancements  in  GaN  HEMT  device-level  thermal  management  consist  of  integrating  high-thermal  conductivity  chemical  vapor  deposited  (CVD)  diamond  substrates  to  GaN  HEMT  device  layers  (GaN-on-diamond  technology).  While  the  thermal  merits  for  CVD  diamond  substrate  integration  are  clear,  the  structural  integrity  and  reliability  of  GaN-on-diamond  HEMTs  requires  further  investigation.  To  study  the  structural  impact  that  CVD  diamond  integration  has  on  GaN  HEMTs,  GaN-on-diamond  materials  fabricated  by  various  techniques  have  been  examined  via  optical  stress  metrology  techniques.Ultra-wide  bandgap  (UWBG)  aluminum  gallium  nitride  (AlGaN)  HEMTs  have  the  potential  to  exceed  the  performance  limitations  of  GaN  HEMTs  for  the  next  generation  of  power  and  RF  electronic  device  technologies.  The  acute  self-heating  challenges  for  highpower  GaN  HEMTs  are  exacerbated  for  AlGaN  HEMTs  because  the  thermal  conductivity  of  AlGaN  is  an  order  of  magnitude  lower  than  that  of  GaN.  The  low  thermal  conductivity  of  AlGaN  increases  the  device  thermal  resistance  of  AlGaN  HEMTs  and  changes  the  transient  thermal  dynamics  of  AlGaN  HEMTs  under  pulsed-mode  operation.  Therefore,  AlGaN  HEMT  devices  require  novel  device-level  thermal  management  solutions  to  realize  their  theoretical  performance  potential.  To  address  the  thermal  management  challenges,  novel  device-level  thermal  management  approaches  have  been  identified  via  thermal  finite  element  analysis  (FEA)  and  in  situ  junction  temperature  experiments.
■590    ▼aSchool  code:  0078.
■650  4▼aSilicon  nitride
■650  4▼aTransmission  electron  microscopy
■650  4▼aSatellite  communications
■650  4▼aSpectrum  analysis
■650  4▼aFailure  analysis
■650  4▼aSemiconductors
■650  4▼aResidual  stress
■650  4▼aConductivity
■650  4▼aElectric  fields
■650  4▼aElectric  vehicles
■650  4▼aChemical  vapor  deposition
■650  4▼aLight  emitting  diodes
■650  4▼aAluminum
■650  4▼aMolecular  beam  epitaxy
■650  4▼aElectronics
■650  4▼aTransistors
■650  4▼aStress  analysis
■650  4▼aHeat  conductivity
■650  4▼aThin  films
■650  4▼aStress  measurement
■650  4▼aScanning  electron  microscopy
■650  4▼aAerospace  engineering
■650  4▼aAnalytical  chemistry
■650  4▼aCondensed  matter  physics
■650  4▼aElectrical  engineering
■650  4▼aMaterials  science
■650  4▼aOptics
■650  4▼aThermodynamics
■650  4▼aTransportation
■650  4▼aElectromagnetics
■690    ▼a0538
■690    ▼a0486
■690    ▼a0611
■690    ▼a0544
■690    ▼a0794
■690    ▼a0752
■690    ▼a0348
■690    ▼a0709
■690    ▼a0607
■71020▼aGeorgia  Institute  of  Technology.
■7730  ▼tDissertations  Abstracts  International▼g87-05A.
■790    ▼a0078
■791    ▼aPh.D.
■792    ▼a2023
■793    ▼aEnglish
■85640▼uhttp://www.riss.kr/pdu/ddodLink.do?id=T17366016▼nKERIS▼z이  자료의  원문은  한국교육학술정보원에서  제공합니다.

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