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Advanced Modeling Techniques for Ferroelectric Memories: From TCAD to Machine Learning
Advanced Modeling Techniques for Ferroelectric Memories: From TCAD to Machine Learning
Detailed Information
- 자료유형
- 학위논문 서양
- 최종처리일시
- 20260209102911
- ISBN
- 9798265406255
- DDC
- 363.25
- 저자명
- Choe, Gihun.
- 서명/저자
- Advanced Modeling Techniques for Ferroelectric Memories: From TCAD to Machine Learning
- 발행사항
- [Sl] : Georgia Institute of Technology, 2023
- 발행사항
- Ann Arbor : ProQuest Dissertations & Theses, 2023
- 형태사항
- 106 p
- 주기사항
- Source: Dissertations Abstracts International, Volume: 87-05, Section: B.
- 주기사항
- Advisor: Yu, Shimeng.
- 학위논문주기
- Thesis (Ph.D.)--Georgia Institute of Technology, 2023.
- 초록/해제
- 요약The continued miniaturization of complementary metal-oxide-semiconductors (CMOS) has been a core for enhancing their performance, expanding functionality, and reducing cost per cell by following Moore's law. Similarly, memory devices have pursued relentless scaling the device dimension. A prime example is the state-of-the-art Flash memory, which has adopted layer stacking techniques to increase the memory density. As such, the trajectory towards emerging nonvolatile memories is a predictable evolution.Within this realm, the ferroelectric field-effect transistor (FeFET) stands out as a promising candidate. With attributes like fast switching speed and low operation voltage, FeFET is reshaping the landscape of memory technologies. To ensure its seamless integration into future architectures, this thesis delves into a comprehensive variation analysis of FeFETs, especially focusing on advanced technology nodes and threedimensional architectures. Embracing this challenge, an avant-garde computational approach involving the Voronoi diagram becomes the linchpin for realistic modeling, capturing the unpredictable nature of ferroelectric grain distributions.In tandem with these explorations, the burgeoning field of machine learning offers a beacon of hope for enhancing analysis precision and efficiency due to its transformative capabilities. Its role in the semiconductor arena is no exception, providing tools for technology pathfinding, compact modeling, and performance analytics. In this light, this thesis introduces a machine learning-centric approach tailored for ferroelectric memory assessment, targeting significant reductions in design-technology co-optimization timeframes while sharpening predictive precision.
- 일반주제명
- Investigations
- 일반주제명
- Electric fields
- 일반주제명
- Neural networks
- 일반주제명
- Probability
- 일반주제명
- CMOS
- 일반주제명
- Grain size
- 일반주제명
- Transistors
- 일반주제명
- Thin films
- 일반주제명
- Ferroelectrics
- 일반주제명
- Condensed matter physics
- 일반주제명
- Electrical engineering
- 일반주제명
- Materials science
- 일반주제명
- Electromagnetics
- 기본자료저록
- Dissertations Abstracts International. 87-05B.
- 전자적 위치 및 접속
- 로그인 후 원문을 볼 수 있습니다.
MARC
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■006m o d
■007cr#unu||||||||
■020 ▼a9798265406255
■035 ▼a(MiAaPQ)AAI32315834
■035 ▼a(MiAaPQ)GeorgiaTech76808
■040 ▼aMiAaPQ▼cMiAaPQ
■0820 ▼a363.25
■1001 ▼aChoe, Gihun.
■24510▼aAdvanced Modeling Techniques for Ferroelectric Memories: From TCAD to Machine Learning
■260 ▼a[Sl]▼bGeorgia Institute of Technology▼c2023
■260 1▼aAnn Arbor▼bProQuest Dissertations & Theses▼c2023
■300 ▼a106 p
■500 ▼aSource: Dissertations Abstracts International, Volume: 87-05, Section: B.
■500 ▼aAdvisor: Yu, Shimeng.
■5021 ▼aThesis (Ph.D.)--Georgia Institute of Technology, 2023.
■520 ▼aThe continued miniaturization of complementary metal-oxide-semiconductors (CMOS) has been a core for enhancing their performance, expanding functionality, and reducing cost per cell by following Moore's law. Similarly, memory devices have pursued relentless scaling the device dimension. A prime example is the state-of-the-art Flash memory, which has adopted layer stacking techniques to increase the memory density. As such, the trajectory towards emerging nonvolatile memories is a predictable evolution.Within this realm, the ferroelectric field-effect transistor (FeFET) stands out as a promising candidate. With attributes like fast switching speed and low operation voltage, FeFET is reshaping the landscape of memory technologies. To ensure its seamless integration into future architectures, this thesis delves into a comprehensive variation analysis of FeFETs, especially focusing on advanced technology nodes and threedimensional architectures. Embracing this challenge, an avant-garde computational approach involving the Voronoi diagram becomes the linchpin for realistic modeling, capturing the unpredictable nature of ferroelectric grain distributions.In tandem with these explorations, the burgeoning field of machine learning offers a beacon of hope for enhancing analysis precision and efficiency due to its transformative capabilities. Its role in the semiconductor arena is no exception, providing tools for technology pathfinding, compact modeling, and performance analytics. In this light, this thesis introduces a machine learning-centric approach tailored for ferroelectric memory assessment, targeting significant reductions in design-technology co-optimization timeframes while sharpening predictive precision.
■590 ▼aSchool code: 0078.
■650 4▼aInvestigations
■650 4▼aElectric fields
■650 4▼aNeural networks
■650 4▼aProbability
■650 4▼aCMOS
■650 4▼aGrain size
■650 4▼aTransistors
■650 4▼aThin films
■650 4▼aFerroelectrics
■650 4▼aCondensed matter physics
■650 4▼aElectrical engineering
■650 4▼aMaterials science
■650 4▼aElectromagnetics
■690 ▼a0800
■690 ▼a0611
■690 ▼a0544
■690 ▼a0794
■690 ▼a0607
■71020▼aGeorgia Institute of Technology.
■7730 ▼tDissertations Abstracts International▼g87-05B.
■790 ▼a0078
■791 ▼aPh.D.
■792 ▼a2023
■793 ▼aEnglish
■85640▼uhttp://www.riss.kr/pdu/ddodLink.do?id=T17365997▼nKERIS▼z이 자료의 원문은 한국교육학술정보원에서 제공합니다.
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