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Advanced Modeling Techniques for Ferroelectric Memories: From TCAD to Machine Learning
Advanced Modeling Techniques for Ferroelectric Memories: From TCAD to Machine Learning
Advanced Modeling Techniques for Ferroelectric Memories: From TCAD to Machine Learning

Detailed Information

자료유형  
 학위논문 서양
최종처리일시  
20260209102911
ISBN  
9798265406255
DDC  
363.25
저자명  
Choe, Gihun.
서명/저자  
Advanced Modeling Techniques for Ferroelectric Memories: From TCAD to Machine Learning
발행사항  
[Sl] : Georgia Institute of Technology, 2023
발행사항  
Ann Arbor : ProQuest Dissertations & Theses, 2023
형태사항  
106 p
주기사항  
Source: Dissertations Abstracts International, Volume: 87-05, Section: B.
주기사항  
Advisor: Yu, Shimeng.
학위논문주기  
Thesis (Ph.D.)--Georgia Institute of Technology, 2023.
초록/해제  
요약The continued miniaturization of complementary metal-oxide-semiconductors (CMOS) has been a core for enhancing their performance, expanding functionality, and reducing cost per cell by following Moore's law. Similarly, memory devices have pursued relentless scaling the device dimension. A prime example is the state-of-the-art Flash memory, which has adopted layer stacking techniques to increase the memory density. As such, the trajectory towards emerging nonvolatile memories is a predictable evolution.Within this realm, the ferroelectric field-effect transistor (FeFET) stands out as a promising candidate. With attributes like fast switching speed and low operation voltage, FeFET is reshaping the landscape of memory technologies. To ensure its seamless integration into future architectures, this thesis delves into a comprehensive variation analysis of FeFETs, especially focusing on advanced technology nodes and threedimensional architectures. Embracing this challenge, an avant-garde computational approach involving the Voronoi diagram becomes the linchpin for realistic modeling, capturing the unpredictable nature of ferroelectric grain distributions.In tandem with these explorations, the burgeoning field of machine learning offers a beacon of hope for enhancing analysis precision and efficiency due to its transformative capabilities. Its role in the semiconductor arena is no exception, providing tools for technology pathfinding, compact modeling, and performance analytics. In this light, this thesis introduces a machine learning-centric approach tailored for ferroelectric memory assessment, targeting significant reductions in design-technology co-optimization timeframes while sharpening predictive precision.
일반주제명  
Investigations
일반주제명  
Electric fields
일반주제명  
Neural networks
일반주제명  
Probability
일반주제명  
CMOS
일반주제명  
Grain size
일반주제명  
Transistors
일반주제명  
Thin films
일반주제명  
Ferroelectrics
일반주제명  
Condensed matter physics
일반주제명  
Electrical engineering
일반주제명  
Materials science
일반주제명  
Electromagnetics
기타저자  
Georgia Institute of Technology.
기본자료저록  
Dissertations Abstracts International. 87-05B.
전자적 위치 및 접속  
로그인 후 원문을 볼 수 있습니다.

MARC

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■1001  ▼aChoe,  Gihun.
■24510▼aAdvanced  Modeling  Techniques  for  Ferroelectric  Memories:  From  TCAD  to  Machine  Learning
■260    ▼a[Sl]▼bGeorgia  Institute  of  Technology▼c2023
■260  1▼aAnn  Arbor▼bProQuest  Dissertations  &  Theses▼c2023
■300    ▼a106  p
■500    ▼aSource:  Dissertations  Abstracts  International,  Volume:  87-05,  Section:  B.
■500    ▼aAdvisor:  Yu,  Shimeng.
■5021  ▼aThesis  (Ph.D.)--Georgia  Institute  of  Technology,  2023.
■520    ▼aThe  continued  miniaturization  of  complementary  metal-oxide-semiconductors  (CMOS)  has  been  a  core  for  enhancing  their  performance,  expanding  functionality,  and  reducing  cost  per  cell  by  following  Moore's  law.  Similarly,  memory  devices  have  pursued  relentless  scaling  the  device  dimension.  A  prime  example  is  the  state-of-the-art  Flash  memory,  which  has  adopted  layer  stacking  techniques  to  increase  the  memory  density.  As  such,  the  trajectory  towards  emerging  nonvolatile  memories  is  a  predictable  evolution.Within  this  realm,  the  ferroelectric  field-effect  transistor  (FeFET)  stands  out  as  a  promising  candidate.  With  attributes  like  fast  switching  speed  and  low  operation  voltage,  FeFET  is  reshaping  the  landscape  of  memory  technologies.  To  ensure  its  seamless  integration  into  future  architectures,  this  thesis  delves  into  a  comprehensive  variation  analysis  of  FeFETs,  especially  focusing  on  advanced  technology  nodes  and  threedimensional  architectures.  Embracing  this  challenge,  an  avant-garde  computational  approach  involving  the  Voronoi  diagram  becomes  the  linchpin  for  realistic  modeling,  capturing  the  unpredictable  nature  of  ferroelectric  grain  distributions.In  tandem  with  these  explorations,  the  burgeoning  field  of  machine  learning  offers  a  beacon  of  hope  for  enhancing  analysis  precision  and  efficiency  due  to  its  transformative  capabilities.  Its  role  in  the  semiconductor  arena  is  no  exception,  providing  tools  for  technology  pathfinding,  compact  modeling,  and  performance  analytics.  In  this  light,  this  thesis  introduces  a  machine  learning-centric  approach  tailored  for  ferroelectric  memory  assessment,  targeting  significant  reductions  in  design-technology  co-optimization  timeframes  while  sharpening  predictive  precision.
■590    ▼aSchool  code:  0078.
■650  4▼aInvestigations
■650  4▼aElectric  fields
■650  4▼aNeural  networks
■650  4▼aProbability
■650  4▼aCMOS
■650  4▼aGrain  size
■650  4▼aTransistors
■650  4▼aThin  films
■650  4▼aFerroelectrics
■650  4▼aCondensed  matter  physics
■650  4▼aElectrical  engineering
■650  4▼aMaterials  science
■650  4▼aElectromagnetics
■690    ▼a0800
■690    ▼a0611
■690    ▼a0544
■690    ▼a0794
■690    ▼a0607
■71020▼aGeorgia  Institute  of  Technology.
■7730  ▼tDissertations  Abstracts  International▼g87-05B.
■790    ▼a0078
■791    ▼aPh.D.
■792    ▼a2023
■793    ▼aEnglish
■85640▼uhttp://www.riss.kr/pdu/ddodLink.do?id=T17365997▼nKERIS▼z이  자료의  원문은  한국교육학술정보원에서  제공합니다.

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