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Kinetic and Fluid Modeling of Magnetized Low-Temperature Plasma Discharges
Kinetic and Fluid Modeling of Magnetized Low-Temperature Plasma Discharges
Detailed Information
- 자료유형
- 학위논문 서양
- 최종처리일시
- 20260202105257
- ISBN
- 9798273301870
- DDC
- 530
- 서명/저자
- Kinetic and Fluid Modeling of Magnetized Low-Temperature Plasma Discharges
- 발행사항
- [Sl] : University of Colorado at Boulder, 2025
- 발행사항
- Ann Arbor : ProQuest Dissertations & Theses, 2025
- 형태사항
- 133 p
- 주기사항
- Source: Dissertations Abstracts International, Volume: 87-07, Section: B.
- 주기사항
- Advisor: Cary, John.
- 학위논문주기
- Thesis (Ph.D.)--University of Colorado at Boulder, 2025.
- 초록/해제
- 요약Low-temperature plasma discharges are vital to integrated circuit fabrication, surface engineering, satellite propulsion, and many other high-technology processes. These technologies rely on myriad forms of plasma discharge, each with their own unique design challenges and gaps in understanding. In this work, we investigate two distinct discharge phenomena: Paschen's law and direct-current magnetron sputtering (DCMS). Paschen's law, which relates the breakdown voltage of a gas filled capacitor to the product of the gas pressure and gap distance, is a classic plasma physics result that is fundamental to many of these discharges since it defines the ideal ignition conditions. DCMS is an $\\mathbf{E} \imes \\mathbf{B}$ discharge that is widely used to deposit thin films. In this dissertation, we demonstrate the utility of particle-in-cell (PIC) methods to simulate these low-temperature plasma discharges. PIC allows us to model the plasma kinetically, capturing the non-Maxwellian nature of these low-pressure devices. PIC simulations are computationally expensive, so we explore techniques to reduce runtime and make practical device simulation feasible. These techniques include the speed-limited particle-in-cell (SLPIC) method, which limits the speed of the fastest particles to enable larger timesteps. This work is the first demonstration of the integration of SLPIC particles with the Monte Carlo Collisions (MCC) method, which we use to simulate Townsend discharge and Paschen's law. We benchmark our simulated Paschen curve to experiment, and validate it with conventional PIC simulation, showing that SLPIC provides a two-order-of-magnitude speedup. We also present a dynamic, recursive coordinate bisection (RCB) method for load balancing parallelized simulations with non-uniform, non-steady-state plasmas. Leveraging RCB, we model DCMS with 2D-RZ PIC simulation. Our simulations reproduce the experimentally observed voltage versus pressure (V-P) dependence of the device and indicate that the previously dominant theory explaining the V-P dependence was incorrect. To explain the V-P dependence of DCMS, we develop a steady-state 1D-axial fluid model of the discharge that accurately reproduces the V-P dependence and exposes the underlying physics. Our PIC simulations and fluid model also provide insights into electron transport and energization, ion sputtering profiles, and spatial variations in the discharge.
- 일반주제명
- Plasma physics
- 일반주제명
- Computational physics
- 일반주제명
- Applied physics
- 키워드
- Paschen's law
- 키워드
- Plasma discharge
- 키워드
- Simulation
- 기타저자
- University of Colorado at Boulder Physics
- 기본자료저록
- Dissertations Abstracts International. 87-07B.
- 전자적 위치 및 접속
- 로그인 후 원문을 볼 수 있습니다.
MARC
008260126s2025 us c eng d■001000017360057
■00520260202105257
■006m o d
■007cr#unu||||||||
■020 ▼a9798273301870
■035 ▼a(MiAaPQ)AAI32279564
■040 ▼aMiAaPQ▼cMiAaPQ
■0820 ▼a530
■1001 ▼aTheis, Joseph George .
■24510▼aKinetic and Fluid Modeling of Magnetized Low-Temperature Plasma Discharges
■260 ▼a[Sl]▼bUniversity of Colorado at Boulder▼c2025
■260 1▼aAnn Arbor▼bProQuest Dissertations & Theses▼c2025
■300 ▼a133 p
■500 ▼aSource: Dissertations Abstracts International, Volume: 87-07, Section: B.
■500 ▼aAdvisor: Cary, John.
■5021 ▼aThesis (Ph.D.)--University of Colorado at Boulder, 2025.
■520 ▼aLow-temperature plasma discharges are vital to integrated circuit fabrication, surface engineering, satellite propulsion, and many other high-technology processes. These technologies rely on myriad forms of plasma discharge, each with their own unique design challenges and gaps in understanding. In this work, we investigate two distinct discharge phenomena: Paschen's law and direct-current magnetron sputtering (DCMS). Paschen's law, which relates the breakdown voltage of a gas filled capacitor to the product of the gas pressure and gap distance, is a classic plasma physics result that is fundamental to many of these discharges since it defines the ideal ignition conditions. DCMS is an $\\mathbf{E} \imes \\mathbf{B}$ discharge that is widely used to deposit thin films. In this dissertation, we demonstrate the utility of particle-in-cell (PIC) methods to simulate these low-temperature plasma discharges. PIC allows us to model the plasma kinetically, capturing the non-Maxwellian nature of these low-pressure devices. PIC simulations are computationally expensive, so we explore techniques to reduce runtime and make practical device simulation feasible. These techniques include the speed-limited particle-in-cell (SLPIC) method, which limits the speed of the fastest particles to enable larger timesteps. This work is the first demonstration of the integration of SLPIC particles with the Monte Carlo Collisions (MCC) method, which we use to simulate Townsend discharge and Paschen's law. We benchmark our simulated Paschen curve to experiment, and validate it with conventional PIC simulation, showing that SLPIC provides a two-order-of-magnitude speedup. We also present a dynamic, recursive coordinate bisection (RCB) method for load balancing parallelized simulations with non-uniform, non-steady-state plasmas. Leveraging RCB, we model DCMS with 2D-RZ PIC simulation. Our simulations reproduce the experimentally observed voltage versus pressure (V-P) dependence of the device and indicate that the previously dominant theory explaining the V-P dependence was incorrect. To explain the V-P dependence of DCMS, we develop a steady-state 1D-axial fluid model of the discharge that accurately reproduces the V-P dependence and exposes the underlying physics. Our PIC simulations and fluid model also provide insights into electron transport and energization, ion sputtering profiles, and spatial variations in the discharge.
■590 ▼aSchool code: 0051.
■650 4▼aPlasma physics
■650 4▼aComputational physics
■650 4▼aApplied physics
■653 ▼aMagnetron sputtering
■653 ▼aPaschen's law
■653 ▼aPlasma discharge
■653 ▼aSimulation
■690 ▼a0759
■690 ▼a0216
■690 ▼a0215
■71020▼aUniversity of Colorado at Boulder▼bPhysics.
■7730 ▼tDissertations Abstracts International▼g87-07B.
■790 ▼a0051
■791 ▼aPh.D.
■792 ▼a2025
■793 ▼aEnglish
■85640▼uhttp://www.riss.kr/pdu/ddodLink.do?id=T17360057▼nKERIS▼z이 자료의 원문은 한국교육학술정보원에서 제공합니다.
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