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Thermal Management and Transistor Modeling for Three-Dimensional Integrated Circuits
Thermal Management and Transistor Modeling for Three-Dimensional Integrated Circuits
상세정보
- 자료유형
- 학위논문 서양
- 최종처리일시
- 20260202104739
- ISBN
- 9798290651866
- DDC
- 621
- 서명/저자
- Thermal Management and Transistor Modeling for Three-Dimensional Integrated Circuits
- 발행사항
- [Sl] : Stanford University, 2024
- 발행사항
- Ann Arbor : ProQuest Dissertations & Theses, 2024
- 형태사항
- 138 p
- 주기사항
- Source: Dissertations Abstracts International, Volume: 87-04, Section: B.
- 주기사항
- Advisor: Pop, Eric.
- 학위논문주기
- Thesis (Ph.D.)--Stanford University, 2024.
- 초록/해제
- 요약In engineering, one usually seeks compromises to meet specifications for a certain application. A relatively unusual thing about integrated circuits (IC) before 2000s is that there was such a thing as "free lunch." As we made transistors smaller, they got cheaper, faster, more energy efficient, and more of them could be packed onto an IC to drive an explosive increase in functionality and accessibility for decades, with essentially no tradeoffs. There were humps along the way, calling for technological advancements to make this possible, but life was relatively easy. As we reach physical limits in transistor size and temperature that hinder conventional two-dimensional scaling, this is no longer the case.To meet the ever-increasing demand for computation around the world, and curb the associated rise in energy consumption, new scaling paradigms are needed to cram more devices onto a semiconductor package and increase energy efficiency. It seems clear that the path forward is in going three-dimensional (3D), stacking logic and memory elements vertically to dramatically increase transistor density and connectivity. However, going vertical does come with significant engineering challenges that need to be ironed out to enable high-volume production of dense, monolithic 3D ICs, allowing scalable advancements in computing. This thesis presents thermal and electrical models to explore and address certain aspects of these issues.I begin with a historical perspective on the exigent challenges that exist in computing today. This is followed by a discussion of the key barriers to broader uptake of 3D ICs that I have focused on during my PhD work, along with proposed solutions. 3D ICs have special cooling needs due to the difficulty of removing heat from the upper layers of the 3D stack, as well as increased transistor count (and hence power) per unit area. Moreover, monolithic 3D integration calls for transistors that can be fabricated at low temperature on noncrystalline materials and/or non-planar features, for which two-dimensional (2D) materials are promising candidates.Next, I explore passive conduction-based cooling solutions for 3D ICs that utilize high-thermal conductivity insulators as the interlayer dielectric. I show that isotropic insulators like AlN can essentially eliminate the inter-tier temperature differences that result due to the thermal resistance between the different layers in the 3D stack, which is especially useful for 3D ICs based on a logic-on-logic architecture. On the other hand, highly anisotropic insulators such as hexagonal BN (hBN) can be useful in a memory-on-logic architecture, cooling the logic layer(s) while simultaneously providing a degree of thermal isolation between logic and memory to keep the memory layer(s) cool.I then discuss the unique thermal challenges of 2D semiconductor transistors, which are promising candidates for back-end-of-line (BEOL) compatible transistors for 3D ICs. I show that the interfaces and the contact electrodes play an important role in cooling these devices, and that keeping these devices cool is largely a problem of optimizing the interfaces of the semiconductor. I also present fast analytical thermal models of these devices that can be packaged into electrical compact models to accurately capture self-heating effects in circuit simulations.Finally, I quantify fringe currents in transistors with an unpatterned channel, which can prevent the accurate evaluation of materials and fabrication processes for transistors. Such material discovery is important for progress towards monolithic 3D ICs, given their need for new transistor technologies. I show that contact resistance and velocity saturation can more than double fringe currents in such devices, causing mobility to be overestimated by up to 70% in typical devices. I conclude with a summary of my contributions, and a perspective on future progress required to enable widespread adoption of 3D ICs, as well as monolithic 3D integration. I provide a list of my major contributions to other studies in an appendix at the end of this thesis.
- 일반주제명
- Heat transfer
- 일반주제명
- Integrated circuits
- 일반주제명
- Semiconductor research
- 일반주제명
- Diamonds
- 일반주제명
- Cooling
- 일반주제명
- Conductivity
- 일반주제명
- Microscopy
- 일반주제명
- Transistors
- 일반주제명
- Indium tin oxides
- 일반주제명
- Heat conductivity
- 일반주제명
- Thin films
- 일반주제명
- Geometry
- 일반주제명
- Thermodynamics
- 일반주제명
- Electrical engineering
- 기타저자
- Stanford University.
- 기본자료저록
- Dissertations Abstracts International. 87-04B.
- 전자적 위치 및 접속
- 로그인 후 원문을 볼 수 있습니다.
MARC
008260126s2024 us c eng d■001000017358698
■00520260202104739
■006m o d
■007cr#unu||||||||
■020 ▼a9798290651866
■035 ▼a(MiAaPQ)AAI32149685
■035 ▼a(MiAaPQ)Stanfordmk057nv5270
■040 ▼aMiAaPQ▼cMiAaPQ
■0820 ▼a621
■1001 ▼aKöroğlu, Çağil.
■24510▼aThermal Management and Transistor Modeling for Three-Dimensional Integrated Circuits
■260 ▼a[Sl]▼bStanford University▼c2024
■260 1▼aAnn Arbor▼bProQuest Dissertations & Theses▼c2024
■300 ▼a138 p
■500 ▼aSource: Dissertations Abstracts International, Volume: 87-04, Section: B.
■500 ▼aAdvisor: Pop, Eric.
■5021 ▼aThesis (Ph.D.)--Stanford University, 2024.
■520 ▼aIn engineering, one usually seeks compromises to meet specifications for a certain application. A relatively unusual thing about integrated circuits (IC) before 2000s is that there was such a thing as "free lunch." As we made transistors smaller, they got cheaper, faster, more energy efficient, and more of them could be packed onto an IC to drive an explosive increase in functionality and accessibility for decades, with essentially no tradeoffs. There were humps along the way, calling for technological advancements to make this possible, but life was relatively easy. As we reach physical limits in transistor size and temperature that hinder conventional two-dimensional scaling, this is no longer the case.To meet the ever-increasing demand for computation around the world, and curb the associated rise in energy consumption, new scaling paradigms are needed to cram more devices onto a semiconductor package and increase energy efficiency. It seems clear that the path forward is in going three-dimensional (3D), stacking logic and memory elements vertically to dramatically increase transistor density and connectivity. However, going vertical does come with significant engineering challenges that need to be ironed out to enable high-volume production of dense, monolithic 3D ICs, allowing scalable advancements in computing. This thesis presents thermal and electrical models to explore and address certain aspects of these issues.I begin with a historical perspective on the exigent challenges that exist in computing today. This is followed by a discussion of the key barriers to broader uptake of 3D ICs that I have focused on during my PhD work, along with proposed solutions. 3D ICs have special cooling needs due to the difficulty of removing heat from the upper layers of the 3D stack, as well as increased transistor count (and hence power) per unit area. Moreover, monolithic 3D integration calls for transistors that can be fabricated at low temperature on noncrystalline materials and/or non-planar features, for which two-dimensional (2D) materials are promising candidates.Next, I explore passive conduction-based cooling solutions for 3D ICs that utilize high-thermal conductivity insulators as the interlayer dielectric. I show that isotropic insulators like AlN can essentially eliminate the inter-tier temperature differences that result due to the thermal resistance between the different layers in the 3D stack, which is especially useful for 3D ICs based on a logic-on-logic architecture. On the other hand, highly anisotropic insulators such as hexagonal BN (hBN) can be useful in a memory-on-logic architecture, cooling the logic layer(s) while simultaneously providing a degree of thermal isolation between logic and memory to keep the memory layer(s) cool.I then discuss the unique thermal challenges of 2D semiconductor transistors, which are promising candidates for back-end-of-line (BEOL) compatible transistors for 3D ICs. I show that the interfaces and the contact electrodes play an important role in cooling these devices, and that keeping these devices cool is largely a problem of optimizing the interfaces of the semiconductor. I also present fast analytical thermal models of these devices that can be packaged into electrical compact models to accurately capture self-heating effects in circuit simulations.Finally, I quantify fringe currents in transistors with an unpatterned channel, which can prevent the accurate evaluation of materials and fabrication processes for transistors. Such material discovery is important for progress towards monolithic 3D ICs, given their need for new transistor technologies. I show that contact resistance and velocity saturation can more than double fringe currents in such devices, causing mobility to be overestimated by up to 70% in typical devices. I conclude with a summary of my contributions, and a perspective on future progress required to enable widespread adoption of 3D ICs, as well as monolithic 3D integration. I provide a list of my major contributions to other studies in an appendix at the end of this thesis.
■590 ▼aSchool code: 0212.
■650 4▼aHeat transfer
■650 4▼aIntegrated circuits
■650 4▼aSemiconductor research
■650 4▼aDiamonds
■650 4▼aCooling
■650 4▼aConductivity
■650 4▼aMicroscopy
■650 4▼aTransistors
■650 4▼aIndium tin oxides
■650 4▼aHeat conductivity
■650 4▼aThin films
■650 4▼aGeometry
■650 4▼aThermodynamics
■650 4▼aElectrical engineering
■653 ▼aHigh-thermal conductivity
■653 ▼aThermal management
■653 ▼aIntegrated circuits
■690 ▼a0544
■690 ▼a0348
■71020▼aStanford University.
■7730 ▼tDissertations Abstracts International▼g87-04B.
■790 ▼a0212
■791 ▼aPh.D.
■792 ▼a2024
■793 ▼aEnglish
■85640▼uhttp://www.riss.kr/pdu/ddodLink.do?id=T17358698▼nKERIS▼z이 자료의 원문은 한국교육학술정보원에서 제공합니다.


